Start Date: June 9, 2010End Date: June 10, 2010Location: Center for Microanalysis of Materials, Frederick Seitz Materials Research Laboratory, University of Illinois, Engineering Sciences Building
Physical Electronics is sponsoring the 4th Advanced Materials Characterization Workshop 2010, which will be held June 9 and 10, 2010 at the University of Illinois at Urbana-Champaign.
The Workshop will provide a critical, comparative, and condensed overview of mainstream analytical techniques for materials characterization with emphasis on practical applications and will cover the following techniques:
* atomic force microscopy (AFM)
* x-ray diffraction, reflectivity and fluorescence (XRD, XRR, XRF)
* scanning and transmission electron microscopy (SEM, TEM, STEM)
* focused ion beam (FIB)
* Auger electron spectroscopy (AES)
* x-ray photoelectron spectroscopy (XPS)
* secondary ion mass spectrometry (SIMS)
* Rutherford backscattering (RBS)
* optical spectroscopy (Raman, Photoluminescence, FTIR, ellipsometry), etc.
On Thursday, June 10, at 9:30 AM, a talk entitled “Improving Data Interpretation with AES and XPS”, will be presented by Dr. Ken Bomben of Physical Electronics. Click on the icon below to view a copy of Dr. Bomben's abstract:
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