4th Advanced Materials Characterization Workshop 2010

Location: Engineering Sciences Building, Room 190
1101 West Springfield Avenue, Urbana, IL 61801

Physical Electronics is sponsoring the 4th Advanced Materials Characterization Workshop 2010, which will be held June 9 and 10, 2010 at the University of Illinois at Urbana-Champaign.

The Workshop will provide a critical, comparative, and condensed overview of mainstream analytical techniques for materials characterization with emphasis on practical applications and will cover the following techniques:

* atomic force microscopy (AFM)
* x-ray diffraction, reflectivity and fluorescence (XRD, XRR, XRF)
* scanning and transmission electron microscopy (SEM, TEM, STEM)
* focused ion beam (FIB)
* Auger electron spectroscopy (AES)
* x-ray photoelectron spectroscopy (XPS)
* secondary ion mass spectrometry (SIMS)
* Rutherford backscattering (RBS)
* optical spectroscopy (Raman, Photoluminescence, FTIR, ellipsometry), etc.

On Thursday, June 10, at 9:30 AM, a talk entitled “Improving Data Interpretation with AES and XPS”, will be presented by Dr. Ken Bomben of Physical Electronics.  Click on the icon below to view a copy of Dr. Bomben's abstract:

For more information, go to http://cmm.mrl.uiuc.edu/Workshop2010/