In this one day workshop, presented and sponsored by Physical Electronics (PHI), and hosted by The Frederick Seitz Materials Research Laboratory (FSMRL) at the University of Illinois at Urbana-Champaign, the analytical capabilities and applications of the three most widely used surface analysis techniques will be described; Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS); Scanning Auger Microscopy (SAM); and X-ray Photoelectron Spectroscopy (XPS). For each of the three techniques, PHI Staff Scientists, Dr. Scott Bryan and Dennis Paul, will describe the basic principles followed by a more detailed discussion of recent applications on materials of significance in today’s research environment. After this, instrument tours and demonstrations will be offered on the surface analysis instrumentation available in the Center for Microanalysis of Materials (CMM) at the University of Illinois.
For more information visit the website below and look under "CMM News": cmm.mrl.uiuc.edu/
