This workshop will provide a two-day condensed overview of the most important analytical techniques available in the Center for Microanalysis of Materials (CMM) at the University of Illinois at Urbana-Champaign, with a strong focus in practical applications and problem solving strategies. The workshop will consist of lectures covering techniques such as atomic force microscopy (AFM), x-ray diffraction and reflectivity (XRD, XRR), scanning electron microscopy (SEM), Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), secondary ion mass spectrometry (SIMS), Rutherford backscattering (RBS), near field microscopy and optical spectroscopy. The lectures will be given by The Frederick Seitz Materials Research Laboratory (FS-MRL) facility scientists with 10+ years of hands-on experience in each particular technique.
For more information visit: cmm.mrl.uiuc.edu/Workshop2008/
