PHI Receives Product Award for the Gas Cluster Ion Beam (GCIB) source!

Physical Electronics gained recognition for the second year in a row when AVS revealed their top picks for the Exhibitor Product Awards at the 57^th AVS International Symposium and Exhibition that was held October 17-22, 2010 in Albuquerque, NM.  As part of the Exhibitor Workshop Sessions, Dr, John Hammond, Fellow at Physical Electronics, delivered a presentation announcing the new Gas Cluster Ion Beam (GCIB) source.  The new Physical Electronics Gas Cluster Ion Beam (GCIB) source extends the capabilities of large cluster sources to new X-ray Photoelectron Spectroscopy (XPS) and Time-of-Flight Secondary Ion Mass Spectroscopy (TOF-SIMS) applications for organic depth profiling. The GCIB source can provide deep depth profiles for challenging polymers such as polyimides and polycarbonates not amenable to C₆₀ depth profiling. The GCIB source is available on new PHI XPS and TOF-SIMS systems. Contact the sales person in your area for more information or email us at sales@phi.com.