PHI Quantes XPS/HAXPES Scanning Microprobe

The Quantes is a laboratory-based instrument used for performing both traditional XPS measurements using an Al Kα X-ray source, plus extended depth of analysis experiments using a Cr Kα (hard) X-ray source. The latter is referred to as HAXPES – Hard X-ray Photoelectron Spectroscopy.

The Cr X-ray source provides for depths of analysis roughly 3 times those obtained using an Al X-ray source.

The Quantes is based on the tried and true Quantera XPS platform.

Features of the Quantes:

  • Hard/Soft X-ray Photoelectron Spectroscopy Lab System
  • Traditional XPS Plus HAXPES Experiments
  • Patented Dual Source Scanning Microprobe Technology
  • High Performance Large Area Spectroscopy
  • Micro Area Spectroscopy and Imaging
  • Angle Dependent Depth Profiling
  • High Performance Multi-point Sputter Depth Profiling
  • Hands-off Dual Beam Charge Neutralization
  • Automated Multi-sample and Multi-experiment Analysis
  • Robotic Sample Handling
  • Full Automated, High Throughput Instrument

Optional Features

  • Sample Heating/Cooling Stage and Intro
  • Custom Sample Preparation Chambers
  • 20 kV Ar+ Gas Cluster Ion Beam (GCIB)

Patented XPS/HAXPES Scanning Microprobe Technology

  • Dual monochromatic Al Kα and Cr Kα with scanning microprobe functionality.
  • High sensativity optimization analyzer with 3X transmission gain.
  • X-ray induced secondary electron imaging (SXI).
  • Multi-point spectroscopy and depth profiling with a user defined x-ray beam size.
  • XPS mapping with spectra at every pixel.

Greater Depth Analysis

HAXPES using Cr x-rays offers 3× greater depth of analysis compared to conventional XPS.

HAXPES information depth from the surface of solid samples is larger than conventional XPS as kinetic energy of core photoelectrons are excited.

Patented Dual Beam Charge Neutralization

Traditional electron flood gun charge neutralization is not effective in neutralizing the localized positive charge created by the X-ray beam because the samples static charge interferes with the low energy electron beam.

PHI’s patented dual beam charge neutralization is a reliable and hands free method that uses a low energy ion beam to eliminate the samples static charge allowing the low energy electron beam to reach the sample and neutralize the localized positive charge created by the X-ray beam.

Thin Film Analysis

Si 2p photoelectron line shows a native Si oxide at the PMMA/Si interface, and is observed even in the 35nm film sample when using HAXPES.

Using HAXPES on this multilayer thin film enables the detection of all the components in the stack, and HAXPES shows the buried Cr layer to  be partially oxidized.

Integrated High Throughput Automation

Fully Integrated Surface Analysis Instrument

SmartSoft instrument control software offers an intuitive and simple work flow

MultiPak Data Reduction Software

Data Reduction for XPS and AES

PHI MultiPak is the most comprehensive data reduction and interpretation software package available for electron spectroscopy. The tasks of spectral peak identification, extracting chemical state information, quantification, and detection limit enhancement are addressed with an array of powerful and easy-to-use software tools for spectra, line scans, images and depth profiles. Microsoft Windows XP and Windows 7 compatible, MultiPak can be used on the instrument PC to process data in real time or on an off line PC for report generation.

Advanced Data Reduction Tools

  • Auto peak identification
  • XPS chemical state database
  • XPS spectral deconvolution
  • Quantitative analysis
  • Non-linear least squares fitting
  • Linear least squares fitting
  • Target factor analysis
  • Retrospective chemical imaging
  • Batch mode data processing

Features & Accessories

Standard Features

  • Hard/Soft X-ray Photoelectron Spectroscopy Lab System
  • Traditional XPS Plus HAXPES Experiments
  • Patented Dual Source Scanning Microprobe Technology
  • High Performance Large Area Spectroscopy
  • Mirco Area Spectroscopy and Imaging
  • Angle Dependent Depth Profiling
  • High Performance Multi-point Sputter Depth Profiling
  • Hands-off Dual Beam Charge Neutralization
  • Automated Multi-sample and Multi-experiment Analysis
  • Robotic Sample Handling
  • Fully Automated High Throughput Instrument

Optional Accessories

  • Sample Heating/Cooling Stage and Intro
  • Custom Sample Preparation Chambers
  • 20kV Ar+ Gas Cluster Ion Gun

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