PHI VersaProbe III Scanning XPS Microprobe

Announcing the latest in PHI's line of scanning XPS microprobe instruments - the VersaProbe III. This multi-technique instrument builds on our industry-leading patented scanning microprobe technology and dual beam charge neutralization and takes it to a higher level.

Features of the VersaProbe III:

  • New Analyzer input lens with 2-3 times higher sensitivity for all analysis conditions
  • New Multi-channel detector for faster elemental and chemical imaging
  • New Angle dependent technology for +/- 5 degree solid angle collection for ADXPS measurements
  • Improved Hot/cold stage providing temperatures of -140° C to +600° C
  • New Dedicated hot sample platen operating up to 800° C
  • New 4-contact transferable sample mount for in-situ controlled potential experiments
  • New UPS design for increased sensitivity and improved energy resolution
  • Improved Auger performance providing higher energy resolution and better signal to noise

Micro-Focused Scanning X-ray Source

The core technology of the VersaProbe III is PHI's patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 10 µm. Unique features this technology provides include:

  • Micro-focused, raster scanned x-ray beam
  • X-ray beam induced secondary electron imaging
  • XPS images with spectra at each pixel for retrospective chemical analysis
  • Point or multi-point spectroscopy
  • Point or multi-point thin film analysis

Large Area Spectroscopy

Turnkey Auto Analysis

  • Point and click analysis area definition
  • Robust Auto-Z sample alignment at all spot sizes
  • No-tune dual beam charge neutralization
  • Move without concern from insulator to conductor in auto analysis sequences

Fully Automated Unattended Analysis

Micro Area Spectroscopy

Superior Micro Area Performance

  • Point and click analysis area definition
  • Robust Auto-Z sample alignment
  • No-tune dual beam charge neutralization
  • Move without concern from insulator to conductor in auto analysis sequences

Sputter Depth Profiling

Optimized Configuration

  • Micro-focused x-ray beam
  • High sensitivity spectrometer
  • High performance floating column argon ion gun
  • Turnkey dual beam charge neutralization
  • Compucentric Zalar Rotation™
  • Micro-area sputter depth profiling
  • Multi-point sputter depth profiling

Organic Sputter Depth Profiling

  • Optional 10 and 20 kV C60 ion guns
  • Optional 20 kV Ar2500+ gas cluster ion gun
    • Mass filtered cluster ion sources
    • Bend in ion column to stop neutrals

Multi-Technique Test Chamber

Integrated Optional Accessories

The VersaProbe III test chamber is designed to accept multiple photon and ion sources that are focused at a common point on the sample and controlled from the SmartSoft-VersaProbe user interface.

  1. Scanning x-ray source
  2. Sample introduction chamber
    Optional intro/prep chamber
  3. Argon sputter ion gun
  4. Electron energy analyzer
  5. Optical Microscope
  6. Five axis automated sample manipulator
    Optional hot / cold version shown
  7. LN2 dewar for sample cooling
  8. Optional sample preparation chambers
  9. Optional C60 sputter ion gun
  10. Optional UV light source for UPS
  11. Optional dual anode x-ray source
  12. Optional electron gun for SAM
  13. Optional 20 kV Ar2500+ gas cluster ion gun



Whether you are a casual user or an expert, the work flow driven UI and enhanced feature set will increase your productivity.

  • Intuitive single window user interface
  • Session tabs guide you through the analysis process
  • Integrated sample platen management
  • Point and click analysis area definition on saved images
  • User friendly queuing of multiple analysis tasks
  • Multi-point analysis and sputter depth profiling within an imaged area
  • Fully integrated control of optional accessories

MultiPak Data Reduction Software

Data Reduction for XPS and AES

PHI MultiPak is the most comprehensive data reduction and interpretation software package available for electron spectroscopy. The tasks of spectral peak identification, extracting chemical state information, quantification, and detection limit enhancement are addressed with an array of powerful and easy-to-use software tools for spectra, line scans, images and sputter depth profiles. MultiPak can be used on the instrument PC to process data in real time or on an off line PC for report generation.

Advanced Data Reduction Tools

  • Auto peak identification
  • XPS chemical state database
  • XPS spectral deconvolution
  • Quantitative analysis
  • Non-linear least squares fitting
  • Linear least squares fitting
  • Target factor analysis
  • Retrospective chemical imaging
  • Batch mode data processing

Features & Accessories

Standard Features

  • Scanned, micro-focused, monochromatic x-ray beam
  • X-ray beam induced secondary electron imaging
  • Dual beam charge neutralization
  • Large area XPS
  • Micro-area XPS
  • Chemical state imaging with 128 data channels
  • Sputter depth profiling
  • Floating column argon ion gun
  • Compucentric Zalar rotation
  • Angle dependent XPS
  • Five axis automated sample manipulator
  • 25 mm and 60 mm diameter sample holders

Optional Accessories

  • 10 kV C60 ion gun
  • 20 kV C60 ion gun
  • 20 kV Ar2500+ gas cluster ion gun
  • 100 nm Scanning AES
  • UV light source for UPS
  • Dual anode, achromatic x-ray source
  • Sample transfer vessel
  • Hot / Cold sample manipulator
  • Custom sample preparation chambers

SXI Demo Video

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