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Announcing PHI’s new in situ Dual Gas Cluster Ion Beam (GCIB) and monatomic ion source ​for Quantes XPS instruments

The optional dual-source ion gun, which is equipped with both a high-performance argon gas cluster ion beam and a monatomic argon ion beam, is a replacement for the standard 5 kV monatomic argon ion gun. Two sources share the same gun column with full functionality maintained. Please note, any Quantes in the field can be retrofitted with this capability.

The monatomic ion source provides surface cleaning capability as well as XPS depth profiling at high (up to 5 keV) or low ion impact energies (200 to 500 eV). The gas cluster ion source (up to 20 keV) on the dual source gun provides surface cleaning capability with minimal damage to surface chemical compositions of inorganic and organic materials. It also provides sputter depth profiling, with little to no chemical damage, for a wide range of polymer and organic thin films.  An optional argon gas cluster size measurement tool kit is also available. It is operated by standalone software to measure the cluster size, intensity distribution, and the energy per argon atom.

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© 2020 Physical Electronics, Inc. (PHI) All Rights Reserved.
© 2020 Physical Electronics, Inc. (PHI) All Rights Reserved.