PHI Receives Product Award for the Gas Cluster Ion Beam (GCIB) Source

Physical Electronics gained recognition for the second year in a row when AVS revealed their top picks for the Exhibitor Product Awards at the 57 th AVS International Symposium and Exhibition that was held October 17-22, 2010 in Albuquerque, NM. As part of the Exhibitor Workshop Sessions, Dr, John Hammond, Fellow at Physical Electronics, delivered a presentation announcing the new Gas Cluster Ion Beam (GCIB) source. The new Physical Electronics Gas Cluster Ion Beam (GCIB) source extends the capabilities of large cluster sources to new X-ray Photoelectron Spectroscopy (XPS) and Time-of-Flight Secondary Ion Mass Spectroscopy (TOF-SIMS) applications for organic depth profiling. The GCIB source can provide deep depth profiles for challenging polymers such as polyimides and polycarbonates not amenable to C 60 depth profiling.The GCIB source is available on new PHI XPS and TOF-SIMS systems. Contact the sales person in your area for more information or email us at .
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© 2024 Physical Electronics, Inc. (PHI) All Rights Reserved.