To discuss a project or to request a quote, please contact PHI at analysis@phi.com or call us at 518-650-1892 (8 AM-5 PM CST).
TOF-SIMS Surface Analysis
Reveal the molecular and elemental composition of surfaces with unparalleled clarity using the only true surface-sensitive mass spectrometry technique offered by the PHI nanoTOF II Parallel Imaging MS/MS system. The state-of-the-art TOF-SIMS instrument delivers high-resolution chemical imaging and confident peak identification - ideal for complex materials, multilayer structures, and sensitive organic materials.
Learn more about the TOF-SIMS technique
Available TOF-SIMS Analytical Services
- Surface mass spectrometry with elemental and molecular imaging for ultra-sensitive surface and subsurface characterization
- High spatial resolution down to 50 nm with 1-2 nm sampling depth, ideal for nanoscale surface chemistry and trace analysis
- Detection limit of parts per million (PPM) and parts per billion (PPB)
- Inert sample transfer for air-sensitive materials using a vacuum-compatible vessel
- Multiple ion beams for optimized sputter depth-profiling of organics, inorganics, and hybrid materials: cesium (Cs+), oxygen (O2+), monoatomic argon (Ar+), gas cluster ion beam (GCIB)
- Tandem mass spectrometry (MS/MS) for confident and unambiguous peak identification
Example TOF-SIMS Output – Polymer Spheres on Substrate
Instrument Used for TOF-SIMS Analytical Services
- Maximum sample size of 100 mm x 100 mm x 22 mm
- Analysis area of up to 600 µm x 600 µm
- Spatial resolution of < 500 nm in high mass resolution mode
- Spatial resolution of < 50 nm in high spatial resolution mode
- Sample must be solid and compatible with ultra-high vacuum (no liquid)
PHI nanoTOF II Time-of-Flight SIMS
18725 Lake Drive East,
Chanhassen, MN 55317
© 2025 Physical Electronics, Inc. (PHI)
All Rights Reserved.
© 2025 Physical Electronics, Inc. (PHI)
All Rights Reserved.