TOF-SIMS

Contact

To discuss a project or to request a quote, please contact PHI at analysis@phi.com or call us at 518-650-1892 (8 AM-5 PM CST).

TOF-SIMS Surface Analysis

Reveal the molecular and elemental composition of surfaces with unparalleled clarity using the only true surface-sensitive mass spectrometry technique offered by the PHI nanoTOF II Parallel Imaging MS/MS system. The state-of-the-art TOF-SIMS instrument delivers high-resolution chemical imaging and confident peak identification - ideal for complex materials, multilayer structures, and sensitive organic materials.

Learn more about the TOF-SIMS technique

Available TOF-SIMS Analytical Services

  • Surface mass spectrometry with elemental and molecular imaging for ultra-sensitive surface and subsurface characterization
  • High spatial resolution down to 50 nm with 1-2 nm sampling depth, ideal for nanoscale surface chemistry and trace analysis
  • Detection limit of parts per million (PPM) and parts per billion (PPB)
  • Inert sample transfer for air-sensitive materials using a vacuum-compatible vessel
  • Multiple ion beams for optimized sputter depth-profiling of organics, inorganics, and hybrid materials: cesium (Cs+), oxygen (O2+), monoatomic argon (Ar+), gas cluster ion beam (GCIB)
  • Tandem mass spectrometry (MS/MS) for confident and unambiguous peak identification

Example TOF-SIMS Output – Polymer Spheres on Substrate

Instrument Used for TOF-SIMS Analytical Services

  • Maximum sample size of 100 mm x 100 mm x 22 mm
  • Analysis area of up to 600 µm x 600 µm
  • Spatial resolution of < 500 nm in high mass resolution mode
  • Spatial resolution of < 50 nm in high spatial resolution mode
  • Sample must be solid and compatible with ultra-high vacuum (no liquid)

PHI nanoTOF II Time-of-Flight SIMS

18725 Lake Drive East, Chanhassen, MN 55317
© 2025 Physical Electronics, Inc. (PHI) All Rights Reserved.
© 2025 Physical Electronics, Inc. (PHI) All Rights Reserved.
Cookies