TOF-SIMS

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TOF-SIMS Surface Analysis

Reveal the molecular and elemental composition of surfaces with unparalleled clarity using the only true surface-sensitive mass spectrometry technique offered by the PHI nanoTOF II Parallel Imaging MS/MS system. The state-of-the-art time-of-flight secondary ion mass spectrometry instrument delivers high-resolution chemical imaging and confident peak identification - ideal for complex materials, multilayer structures, and sensitive organic materials.

Learn more about the TOF-SIMS technique.

Available TOF-SIMS Analytical Services

  • Surface mass spectrometry with elemental and molecular imaging for sensitive surface and subsurface characterization
  • High spatial resolution down to 50 nm with 1-2 nm sampling depth, ideal for nanoscale surface chemistry and trace analysis
  • Detection limit of parts per million (PPM) and parts per billion (PPB)
  • Inert sample transfer for air-sensitive materials
  • Multiple ion beams for optimized sputter depth-profiling of organics, inorganics, and hybrid materials: cesium (Cs+), oxygen (O2+), monoatomic argon (Ar+), gas cluster ion beam (GCIB)
  • Tandem mass spectrometry (MS/MS) for unambiguous peak identification

Example TOF-SIMS Output – Polymer Spheres on Substrate

The figure illustrates the molecular imaging capability obtained using the PHI nanoTOF II TOF-SIMS instrument. The model diagram on left shows polymer spheres (red) dispersed on a tape surface (green) with a 100 µm scale bar. The central panel presents a TOF-SIMS molecular image of the same area. The red regions correspond to the molecular ion C₄H₅O₂⁻ and green regions to C₃H₃O₂⁻, indicating distinct spatial distributions of organic species. The right panel shows the underlying TOF-SIMS signals that form the molecular image with color-coded vertical bars representing each ion species. The PHI nanoTOF II offers high spatial resolution and mass accuracy, enabling precise localization and identification of molecular fragments on complex surfaces, making it ideal for advanced surface and interface characterization in materials science, biomaterials, and microelectronics.

 PHI nanoTOF II TOF-SIMS

  • Maximum sample size of 100 mm x 100 mm x 22 mm
  • Analysis area of up to 600 µm x 600 µm
  • Spatial resolution of < 500 nm in high mass resolution mode
  • Spatial resolution of < 50 nm in high spatial resolution mode
  • Sample must be a solid and compatible with ultra-high vacuum (no liquid)

PHI nanoTOF II Time-of-Flight SIMS

Working Principle of TOF-SIMS Technique

Learn more about the TOF-SIMS technique​.

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© 2025 Physical Electronics, Inc. (PHI) All Rights Reserved.
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