PHI Quantes XPS/HAXPES Scanning Microprobe

The PHI Quantes is the only automated, high-throughput lab-based HAXPES spectrometer on the market. It is a unique scanning X-ray photoelectron microprobe that combines a high energy (HAXPES) monochromatic X-ray source (Chromium Kα) with a conventional monochromatic soft X-ray source (Aluminum Kα). Both sources are high flux focused X-ray beams that can be scanned across the sample surface and can be used to define analysis points, areas,  lines, and maps with 100% confidence.

The analytical information depth using the Cr source is about 3 times deeper than with the Al source. This opens opportunities for probing thicker film structures and buried interfaces, as well as minimizing the effects of surface contamination and ion-induced chemical damage during depth profiling.

Bring HAXPES synchrotron capabilities into your lab with the PHI Quantes!

Features of the Quantes

  • Hard/Soft X-ray Photoelectron Spectroscopy Lab System
  • Traditional XPS Plus HAXPES Experiments
  • Patented Dual Source Scanning Microprobe Technology
  • High-Performance Large Area Spectroscopy
  • Micro Area Spectroscopy and Imaging
  • Angle Dependent Depth Profiling
  • High-Performance Multi-point Sputter Depth Profiling
  • Automated Efficient Dual Beam Charge Neutralization
  • Automated Multi-sample and Multi-experiment Analysis
  • Robotic Sample Handling
  • Fully Automated, High Throughput Instrument

Optional Features

  • Sample Positioning Station
  • Dedicated turbopump for Ar ion gun
  • Hot/Cold sample introduction stage
  • 4-contact sample stage
  • Auxiliary chamber for sample transfer to/from  external instruments and glove boxes
  • Dual in situ monoatomic/GCIB sputtering gun
  • Glove box adapter for introduction chamber

HAXPES information depth from the surface of solid samples is larger than conventional XPS as kinetic energy of core photoelectrons are excited.

Patented XPS/HAXPES Scanning Microprobe Technology

  • Dual monochromatic Al Kα and Cr Kα with scanning microprobe functionality.
  • High sensitivity optimization analyzer with 3X transmission gain.
  • X-ray induced secondary electron imaging (SXI).
  • Multi-point spectroscopy and depth profiling with a user defined X-ray beam size.
  • XPS mapping with spectra at every pixel.

Greater Depth Analysis

HAXPES using Cr X-rays offers 3× greater depth of analysis compared to conventional XPS.

HAXPES information depth from the surface of solid samples is larger than conventional XPS as kinetic energy of core photoelectrons are excited.

Access to Higher Energy Core Photoelectron Peaks

Patented Dual Beam Charge Neutralization

Traditional electron flood gun charge neutralization is not effective in neutralizing the localized positive charge created by the X-ray beam because the samples static charge interferes with the low energy electron beam.

PHI’s patented dual beam charge neutralization is a reliable and hands free method that uses a low energy ion beam to eliminate the samples static charge allowing the low energy electron beam to reach the sample and neutralize the localized positive charge created by the X-ray beam.

Thin Film Analysis

Si 2p photoelectron line shows a native Si oxide at the PMMA/Si interface, and is observed even in the 35nm film sample when using HAXPES.

Using HAXPES on this multilayer thin film enables the detection of all the components in the stack, and HAXPES shows the buried Cr layer to  be partially oxidized.

Integrated High Throughput Automation

Fully Integrated Surface Analysis Instrument

SmartSoft instrument control software offers an intuitive and simple work flow

SmartSoft-XPS

Whether you are a casual user or an expert, the work flow driven UI and enhanced feature set will increase your productivity.

  • Intuitive single window user interface
  • Session tabs guide you through the analysis process
  • Integrated sample platen management
  • Point and click analysis area definition on saved images
  • User friendly queuing of multiple analysis tasks
  • Multi-point analysis and sputter depth profiling within an imaged area
  • Fully integrated control of optional accessories

MultiPak Data Reduction Software

Data Reduction for XPS and AES

PHI MultiPak is the most comprehensive data reduction and interpretation software package available for electron spectroscopy. The tasks of spectral peak identification, extracting chemical state information, quantification, and detection limit enhancement are addressed with an array of powerful and easy-to-use software tools for spectra, line scans, images, and sputter depth profiles. MultiPak can be used on the instrument PC to process data in real time or on an offline PC for report generation.

Advanced Data Reduction Tools

  • Auto peak identification
  • XPS chemical state database
  • XPS spectral deconvolution
  • Quantitative analysis
  • Non-linear least squares fitting
  • Linear least squares fitting
  • Target factor analysis
  • Retrospective chemical imaging
  • Batch mode data processing

Features & Accessories

Standard Features

  • Hard/Soft X-ray Photoelectron Spectroscopy Lab System
  • Traditional XPS Plus HAXPES Experiments
  • Patented Dual Source Scanning Microprobe Technology
  • High Performance Large Area Spectroscopy
  • Mirco Area Spectroscopy and Imaging
  • Angle Dependent Depth Profiling
  • High Performance Multi-point Sputter Depth Profiling
  • Hands-off Dual Beam Charge Neutralization
  • Automated Multi-sample and Multi-experiment Analysis
  • Robotic Sample Handling
  • Fully Automated High Throughput Instrument

Optional Accessories

  • Sample Heating/Cooling Stage and Intro
  • Custom Sample Preparation Chambers
  • 20kV Ar+ Gas Cluster Ion Gun

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