VersaProbe III (XPS) Surface Analysis Instrument

Announcing the latest in PHI's line of scanning XPS microprobe instruments - the VersaProbe III. This multi-technique instrument builds on our industry-leading patented scanning microprobe technology and dual beam charge neutralization and takes it to a higher level.

Features of the VersaProbe III:

New Analyzer input lens with 2-3 times higher sensitivity for all analysis conditions
New Multi-channel detector for faster elemental and chemical imaging
New Angle dependent technology for +/- 5 degree solid angle collection for ADXPS measurements
Improved Hot/cold stage providing temperatures of -140° C to +600° C
New Dedicated hot sample platen operating up to 800° C
New 4-contact transferable sample mount for in-situ controlled potential experiments
New UPS design for increased sensitivity and improved energy resolution
Improved Auger performance providing higher energy resolution and better signal to noise

Micro-Focused Scanning X-ray Source

The core technology of the VersaProbe III is PHI's patented, monochromatic, micro-focused, scanning x-ray source which provides excellent large area and superior micro-area spectroscopy performance. Spectroscopy, depth profiling and imaging can all be performed over the full range of x-ray beam sizes including the minimum x-ray beam size of less than 10 µm. Unique features this technology provides include:

Micro-focused, raster scanned x-ray beam
X-ray beam induced secondary electron imaging
XPS images with spectra at each pixel for retrospective chemical analysis
Point or multi-point spectroscopy
Point or multi-point thin film analysis

Large Area Spectroscopy

Turnkey Auto Analysis

Point and click analysis area definition
Robust Auto-Z sample alignment at all spot sizes
No-tune dual beam charge neutralization
Move without concern from insulator to conductor in auto analysis sequences

Photograph of 60 mm diamter sample platen — Photograph of a 60 mm diameter sample platen with multiple samples mounted for automated XPS analysis.

Fully Automated Unattended Analysis

Micro Area Spectroscopy

Superior Micro Area Performance

Point and click analysis area definition
Robust Auto-Z sample alignment
No-tune dual beam charge neutralization
Move without concern from insulator to conductor in auto analysis sequences

SXI Image of PMMA Micro Sphere — SXI image of PMMA micro spheres showing the selected analysis area.

Sputter Depth Profiling

Optimized Configuration

Micro-focused x-ray beam
High sensitivity spectrometer
High performance floating column argon ion gun
Turnkey dual beam charge neutralization
Compucentric Zalar Rotation™
Micro-area sputter depth profiling
Multi-point sputter depth profiling

Inorganic Sputter Depth Profiling

High performance 0-5 keV Ar⁺ ion gun
- Low voltage floating column for ultra thin film sputter depth profiling
- Bend in ion column to stop neutrals

2 keV sputter depth profile of a multi-layer PVD TiC/C coating on silicon performed using Zalar rotation to enhance layer definition.

2 keV sputter depth profile of a multi-layer coating on a computer hard disk performed using Zalar rotation to enhance layer definition.

Organic Sputter Depth Profiling

Optional 10 and 20 kV C₆₀ ion guns
Optional 20 kV Ar₂₅₀₀⁺ gas cluster ion gun
- Mass filtered cluster ion sources
- Bend in ion column to stop neutrals

10 kV C_60⁺ sputter depth profile of 3 nm Irganox 3114 layers in an Irganox 3110 film.

20 kV Ar₂₅₀₀⁺ sputter depth profile of a 10 µm thick multilayer polymer film showing expected composition and layer definition.

Multi-Technique Test Chamber

Integrated Optional Accessories

The VersaProbe III test chamber is designed to accept multiple photon and ion sources that are focused at a common point on the sample and controlled from the SmartSoft-VersaProbe user interface.

Scanning x-ray source
Sample introduction chamber
Optional intro/prep chamber
Argon sputter ion gun
Electron energy analyzer
Optical Microscope
Five axis automated sample manipulator
Optional hot / cold version shown
LN2 dewar for sample cooling
Optional sample preparation chambers
Optional C₆₀ sputter ion gun
Optional UV light source for UPS
Optional dual anode x-ray source
Optional electron gun for SAM
Optional 20 kV Ar₂₅₀₀⁺ gas cluster ion gun

SmartSoft-VersaProbe

SmartSoft

Whether you are a casual user or an expert, the work flow driven UI and enhanced feature set will increase your productivity.

Intuitive single window user interface
Session tabs guide you through the analysis process
Integrated sample platen management
Point and click analysis area definition on saved images
User friendly queuing of multiple analysis tasks
Multi-point analysis and sputter depth profiling within an imaged area
Fully integrated control of optional accessories

SmartSoft-VersaProbe Intuitive Single Window User Interface

MultiPak Data Reduction Software

Data Reduction for XPS and AES

PHI MultiPak is the most comprehensive data reduction and interpretation software package available for electron spectroscopy. The tasks of spectral peak identification, extracting chemical state information, quantification, and detection limit enhancement are addressed with an array of powerful and easy-to-use software tools for spectra, line scans, images and sputter depth profiles. MultiPak can be used on the instrument PC to process data in real time or on an off line PC for report generation.

Advanced Data Reduction Tools

Auto peak identification
XPS chemical state database
XPS spectral deconvolution
Quantitative analysis
Non-linear least squares fitting
Linear least squares fitting
Target factor analysis
Retrospective chemical imaging
Batch mode data processing

Multipak Data Reduction Software — Chemical depth profile of a multi-layer Ni-Cr thin film structure showing the presence of Cr metal and Cr oxide layers.

Features & Accessories

Standard Features

Scanned, micro-focused, monochromatic x-ray beam
X-ray beam induced secondary electron imaging
Dual beam charge neutralization
Large area XPS
Micro-area XPS
Chemical state imaging with 128 data channels
Sputter depth profiling
Floating column argon ion gun
Compucentric Zalar rotation
Angle dependent XPS
Five axis automated sample manipulator
25 mm and 60 mm diameter sample holders

Optional Accessories

10 kV C₆₀ ion gun
20 kV C₆₀ ion gun
20 kV Ar₂₅₀₀⁺ gas cluster ion gun
100 nm Scanning AES
UV light source for UPS
Dual anode, achromatic x-ray source
Sample transfer vessel
Hot / Cold sample manipulator
Custom sample preparation chambers

PHI VersaProbe III Scanning XPS Microprobe