Webinar on Recent Developments and Applications of Lab-based HAXPES Using the PHI Quantes Scanning XPS Microprobe

Presented by Kateryna Artyushkova, Ph. D., Director of Analytical Laboratory and Marketing

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X-ray photoelectron spectroscopy (XPS) is a commonly used surface analysis technique for elemental and chemical characterization of the top few nanometers of a material.  However, analysis of some materials can be tricky when using the traditional monochromatic Al X-ray source due to effects of adventitious contamination, buried interfaces, or spectral overlaps.  With the advent of lab-based hard X-ray spectrometers (HAXPES), higher energy X-ray probe beams allow the collection of photoelectron signals from deeper in the material, thereby minimizing these effects.  Additionally, it is possible to perform ion beam sputter depth profiling while minimizing the effect of atomic mixing or chemical reduction often seen with an Al X-ray source.

In this webinar, Kateryna will discuss recent developments on the PHI Quantes Scanning XPS/HAXPES Microprobe instrument, which utilizes both Al Ka (1486.6 eV) and Cr Ka (5414.8 eV) X-ray sources for XPS and HAXPES analysis, respectively. Significant advances have been made in developing sensitivity factors for quantitative HAXPES analysis, as well as software improvements for data collection and processing.  Several application areas will be highlighted to show the advantage of the Cr X-ray source in analysis of battery materials, microelectronics, carbon-containing materials, and perovskites.

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© 2024 Physical Electronics, Inc. (PHI) All Rights Reserved.