PHI VersaProbe XPS Microprobe
Overview
The PHI 5000 VersaProbe is a multi-technique surface analysis instrument based on PHI’s
highly successful scanning x-ray microprobe technology. This technology provides high performance
XPS micro-area spectroscopy, chemical imaging, and secondary
electron imaging with a raster scanned 10 µm diameter x-ray beam.
PHI’s innovative and patented dual beam charge neutralization method provides turn-key analysis
of insulating samples using a combination of low energy ions and electrons.
The integral floating column argon ion gun provides an impressive sputter depth profiling
capability for inorganic thin film structures. The optional C60 ion gun provides a
unique and powerful organic sputter depth profiling capability.
Scanning x-ray source Sample introduction chamber Argon sputter ion gun Electron energy analyzer Optical microscope Five axis automated sample manipulator Optional UHV sample preparation chambers Optional C60 sputter ion gun Optional UV light source for UPS Optional dual anode x-ray source Optional electron gun for AES
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