Surface Analysis Techniques

Our auger electron spectroscopy (AES) surface analysis equipment provides elemental and in some instances chemical information with the use of a finely focused electron beam to excite the Auger electrons. The analysis of submicron features is routine and thin film analysis is possible with the use of a sputter ion gun to remove material.

PHI's time-of-flight secondary ion mass spectrometry (TOF-SIMS) surface analysis equipment provides elemental, chemical and molecular information by measuring the mass of ions that have been ejected from a samples surface with the use of a focused ion beam.

X-ray photoelectron spectroscopy (XPS) surface analysis instruments provide elemental and chemical state information by measuring the binding energy of photoelectrons that have been excited with a mono-energetic x-ray beam. With the use of a sputter ion gun to remove material, thin film characterization is also possible.

Our Dynamic secondary ion mass spectrometry (D-SIMS) surface analysis equipment provides elemental and chemical information with the use of a quadrupole mass spectrometer to measure the mass of ionic species ejected from a samples surface with an energetic ion beam. The detection of trace elements and low level dopants is a routine dynamic SIMS task.