Surface Analysis Techniques
PHI manufactures a broad range of high performance surface analysis instruments to provide detailed surface chemical characterization, nano-scale feature analysis, and thin film characterization. Our customers can select the technology or technologies that best meet their needs from our catalog of surface analysis equipment. Use the information in this section to learn more about various techniques and the PHI analysis equipment for each surface analysis technique.
Our auger electron spectroscopy (AES) surface analysis equipment provides elemental and in some instances chemical information with the use of a finely focused electron beam to excite the Auger electrons. The analysis of submicron features is routine and thin film analysis is possible with the use of a sputter ion gun to remove material.
X-ray photoelectron spectroscopy (XPS) surface analysis instruments provide elemental and chemical state information by measuring the binding energy of photoelectrons that have been excited with a mono-energetic x-ray beam. With the use of a sputter ion gun to remove material, thin film characterization is also possible.
PHI's time-of-flight secondary ion mass spectrometry (TOF-SIMS) surface analysis equipment provides elemental, chemical and molecular information by measuring the mass of ions that have been ejected from a samples surface with the use of a focused ion beam.