Techniques

PHI manufactures a broad range of high performance surface analysis instruments to provide detailed surface chemical characterization, nano-scale feature analysis, and thin film characterization. Our customers can select the technology or technologies that best meet their needs from our catalog of surface analysis equipment.

Our auger electron spectroscopy (AES) surface analysis equipment provides elemental and in some instances chemical information with the use of a finely focused electron beam to excite the Auger electrons. The analysis of submicron features is routine and thin film analysis is possible with the use of a sputter ion gun to remove material.

PHI's time-of-flight secondary ion mass spectrometry (TOF-SIMS) surface analysis equipment provides elemental, chemical and molecular information by measuring the mass of ions that have been ejected from a samples surface with the use of a focused ion beam.

X-ray photoelectron spectroscopy (XPS) surface analysis instruments provide elemental and chemical state information by measuring the binding energy of photoelectrons that have been excited with a mono-energetic x-ray beam. With the use of a sputter ion gun to remove material, thin film characterization is also possible.

Our Dynamic secondary ion mass spectrometry (D-SIMS) surface analysis equipment provides elemental and chemical information with the use of a quadrupole mass spectrometer to measure the mass of ionic species ejected from a samples surface with an energetic ion beam. The detection of trace elements and low level dopants is a routine dynamic SIMS task.