Dynamic Secondary Ion Mass Spectrometry (D-SIMS) is a highly sensitive analysis technique for in-depth distribution of elements, providing outstanding performance for ultra-fast depth profiling. Using a high transmission quadrupole mass analyzer and field-proven low energy primary ion guns, the ADEPT 2 is the prominent apparatus for analysis of dopants and impurities in thin films and devices.
The ADEPT 2 is the next-generation dynamic SIMS instrument from Physical Electronics, designed to meet the evolving challenges in advanced semiconductor devices. Building on the proven foundation of the ADEPT-1010, the ADEPT 2 introduces key hardware and software enhancements to improve sensitivity, resolution, and automation—making it an ideal tool for both development and high-throughput manufacturing environments.
Key Features of PHI ADEPT 2
- High speed and High sensitivity SIMS
- Ultimate Depth Resolution
- Easy Automated Analysis
- Enables CE compliance
- Newly designed columns for both Cs+ and O2+ ion sources, enabling higher ion beam brightness and optimized performance across a wider range of materials. Reduced working distance between lens and sample improves focusing, resulting in a smaller beam diameter and more precise crater formation.
- Optional ICP oxygen plasma source delivers higher ion current, increased source lifetime and beam stability compared to traditional Duoplasmatron sources, improving dynamic range.
- New high mass detection capabilities allows for analysis of large clusters such as CsM+ and Cs2M+.
- SmartSoft-SIMS instrument control software provides a modern, intuitive interface for streamlined multi-point analysis and automation.
With its advanced ion optics and control capabilities, the ADEPT 2 continues the tradition of high-precision SIMS analysis while expanding its capability to meet the needs of next-generation semiconductor devices.
What Our Customers Say
“The PHI Genesis X-ray Photoelectron Spectroscopy (XPS) instrument has revolutionized our lab's capabilities. Its advanced features and flexibility enable detailed surface material analysis, while PHI's exceptional support ensures smooth operations. The seamless installation and insightful training provided by PHI's knowledgeable field engineers have made this system an invaluable addition to our facilities.”
Quantum Valley Ideas Lab
“PHI's service team is exceptional. Their engineers are professional, reliable, and knowledgeable, always seeking help when needed to ensure reliability. The scientists are equally impressive, providing clear guidance for analysis. PHI's customer service is amazing.”
NY CREATES
“As a global supplier in the automotive, aerospace, and industrial markets, we rely on PHI Auger instruments for customer support, production, and R&D. The PHI 710 Auger, with its state-of-the-art capabilities and excellent customer support, continues to drive our product and process development. The expertise of PHI's service engineers and scientists, along with the flexibility to add specific capabilities, strengthens our long-standing relationship with PHI.”
Manufacturing Customer
“PHI's prompt and willing responses to our VersaProbe system and data analysis concerns have been invaluable. Their excellent application support ensures we always have the help we need.”
University of Virginia
“PHI's TOF-SIMS studies were instrumental in resolving a major issue in our products. Their expertise helped us identify the compromised film, enabling us to successfully address the problem. PHI's support was a significant contributor to our success.”
Semiconductor Contract Customer
Previous Next“We are very pleased with the timely assistance our users have received from PHI's application department over the past six years. The experienced application scientists provide invaluable tips and share application materials promptly, often on the same day. PHI's support has been crucial in expanding our user base and exploring new applications on the system.”
Seagate
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