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Surface Analysis 2011

33rd Symposium on Applied Surface Analysis

Invited speaker, Dr. Ken Bomben of PHI, will present a talk entitled " Surface Analysis Using the Gas Cluster Ion Source (GCIB)" at the 33rd Annual Symposium on Applied Surface Analysis. The symposium, of which PHI is a Gold level sponsor, is being hosted by the AVS Hudson Mohawk Chapter of at The College of Nanoscale Science and Engineering, University at Albany, State University of New York on April 7-11, 2011. It provides a forum for discussion of the quantitative and qualitative aspects of surface analysis. The theme of the meeting will be Surface Microscopy and Microanalysis.

In conjunction with the symposium, an equipment exhibition will also be held, featuring vendors of surface analytical and vacuum technology equipment. Visit the PHI booth to hear the latest developments on the Gas Cluster Ion Source (GCIB). Dr. Bomben is also slated to present an additional talk at the symposium entitled "New Developments for 3D Imaging with TOF-SIMS by FIB Sectioning" .

For pdfs of the abstracts for Dr. Bomben's talks click on the links below:

news/SA2011GCIB.pdf news/SA2011TOF.pdf

For more information on the SA2011 symposium visit: divisions.avs.org/assd/SurfaceAnalysis2011/default.html

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© 2021 Physical Electronics, Inc. (PHI) All Rights Reserved.